Ø The Xtreme Laser Facility (XLF) comprises a unique, dual beamline, 157nm deep ultraviolet and 795nm femtosecond laser combination on a single platform for micro- & nano-machining. This has been designed to address the diverse needs for product developments including.those for Lab-on-a-Chip microfluidic, microreactor, photonic and chemical separations. 

Of all lasers, the 157nm excimer laser delivers superior nanoscale roughness of <20um which is ideal dor phonics, microfluidic and replicative applications. It is suitable for highly miniaturised prototyping, mastering and small-volume manufacture.

The femtosecond laser is ideal for applications involving Instrumentation Engineering, Microfluidics, Microreactors, Aerospace, BioCHIPS, Nozzles and arrays. Additionally, in contrast to pico-, nano- and micro-sceond lasers, the femtosecond laser is ideally suited to applications where minimal thermal collateral damage to the substrate is important, both in hard materials (such as diamond) but also soft materials such as enzyme containing polymers. This is achieved by virtue of the exceptionally short pulse width (~100 femtoseconds) - which gives rise to its name.
    

The main XLF tool comprises the following features:-   -  157nm   Deep Ultraviolet   Fluorine  [F2]  Laser   -  795nm   Ultrafast (100fs)   Ti:Sapphire  [Ti:Sa] Laser   -  Positional accuracy 50nm (X,Y) 500nm (Z)   -  Ability to machine any material   -  Use both lasers on in-situ workpiece   -  High resolution micromachining of  PEEK, PFTE, Sapphire, Diamond,       Quartz, Metals, Ceramics, Fused Silica,    F2 Laser specifications & capability   -  157nm  1.5W   -  Optics beamline <10ppm O2   -  Spot size >250nm  <150um   -  Material preferences:- Fused silica, Fluorinated polymers, Glass, PEEK,    -  Applications:- Microfluidics; Lab-on-a-Chip; Photonics; Prototyping;       Reusable devices; Mastering Ti:Sa Laser specifications & capability   -  795nm  1.5W   -  Pulse Energy: 1mJ   -  Rep Rate: 5kHz   -  Spot size:  2um   -  Material preferences:-metals, glass, ceramics, polymers, semiconductors,       biomaterials, elastomers   -  Applications:- almost any, including, wafer scribing, gasket cutting,       shadow masks,ducts, hole drilling

femtosecond laser gallery click here   157nm laser gallery click here

193 nm Excimer Laser Tool Additionally, we also have now extended our tool range to include a 193nm excemer laser micromachnining tool. This has more power than the 157nm and also has a wider field of view. However, the roughness is not quite as good as the 157nm laser, but, is nevertheless, much superior to picro-, nano-, and micro- second lasers, as well as other excimer lasers of lonnger wavelength such as 248nm.