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Specifications
Unique Laser Micro- & Nano- Machining Laboratory: Dual Laser on a single platform
[1] 157nm Deep Ultraviolet Fluorine [F2] Laser [B] 795nm Ultrafast (150fs) Ti:Sapphire [Ti:Sa] Laser
Positional accuracy 50nm (X,Y) 500nm (Z)
Ability to machine any material
Use both lasers on in-situ workpiece
F2 Laser specifications & capability
157nm 1.5W
Optics beamline <10ppm O2
Spot size >250nm <150um
Material preferences:- Fused silica, Fluorinated polymers, Glass, PEEK, COC, InP
Applications: Microfluidics; Lab-on-a-Chip; Photonics; Prototyping; Reusable devices; Mastering
Ti:Sa Laser specifications & capability
795nm 1.5W
Pulse Energy: 1mJ
Rep Rate: 5kHz
Spot size: 2um
Material preferences:- metals, glass, ceramics, polymers, semiconductors, biomaterials, elastomers
Applications
roughness reduced by immersive machining
suitable for heat-sensitive materials
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